Photomask Cleaning

Maintaining mask quality in usage is a challenge, and while photomasks are robust, they are not indestructible. The lithography processes used by our customers, regardless of sector, demand that the mask has a level of pattern integrity that enables devices to be manufactured without any imperfections, which may affect performance.

Our cleaning processes combine both chemical and physical methods. A mixture of sulphuric acid and hydrogen peroxide is used to remove photoresist and organic contaminants.

We prioritize quick turns to minimize critical delays or line-stop in fab.

• Same-day cycle time is available
• Use purpose-designed automatic single-substrate mask cleaning tools such as the HMR900, ASC500, or Suss HMx
• Chrome & iron oxide masks can be cleaned as required