Product Overview

The MICROFAB DVF-200 is an acid copper plating process that fills Through-Silicon Vias (TSVs) without voids and other defects at high plating speeds. The process is specially formulated for vias with diameters that range from 5 to 100 μm, and with aspect ratios less than 10.1.

Features

  • Excellent bottom up fill
  • Versatility
  • Ease-of-use

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TDS-icon

MICROFAB-DVF-200-EN-TDS

10x100um TSV

MICROFAB-DVF200

 

MICROFAB DVF-200

Product Name

Cu Packaging Solution

Cu Process Feature

Feature-Property Benefit

MICROFAB DVF-200

TSV

Excellent Bottom Up Fill
Versatility

Ease-of-Use

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