Product Overview
MICROFAB CUMSA100 is a high-purity electroplating process which produces equiaxed-grained matte copper deposits. It is specially formulated for use in the fabrication of bump/pillars on semiconductor wafers. High-build bumps/pillars can be produced on fine semiconductor patterns for excellent performance.
Features
- Wide operating window
- High purity
- Ease-of-use
- Low voiding
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Single Additive System
With a proven scalability down to very small features < (10x10 μm), the single additive system leads to simplicity in maintenance with a wide operating window.
Robust Wafer Plating Process
MICROFAB CUMSA100 is a robust wafer plating process ideal for high volume manufacturing, capable of producing copper pillars with surface roughness less than 100 nm and generating different topographies (dimple, flat, and doom).
MICROFAB CUMSA100
Product Name |
Cu Packaging Solution |
Cu Process Feature |
Feature-Property Benefit |
---|---|---|---|
MICROFAB CUMSA100 |
Pillar/Post |
Wide Operating Window |
Ease-of-Use |